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折扣與優(yōu)惠:團購最低可5折優(yōu)惠 - 了解詳情 | 論文格式:Word格式(*.doc) | ![]() |
摘要:太陽能選擇性吸收膜制備技術(shù)是太陽能熱利用的關(guān)鍵技術(shù)之一,膜系的光學特性是提高光熱轉(zhuǎn)化效率的關(guān)鍵,也是當今科研人員研究的重點課題。本文通過磁控濺射技術(shù)制備TiNxOy和SS-AlN太陽能選擇性吸收膜系,表征了薄膜的結(jié)構(gòu)和表面形貌。TiNxOy膜系Ti靶、Si靶濺射速率較高,制成的TiNxOy薄膜表面形貌光滑均勻,顏色均勻無色差,薄膜平均吸收率可高達92%,發(fā)射率可低到4%。SS-AlN膜系SS靶、Cu靶、Al靶濺射速率很高、濺射均勻,制成SS-AlN薄膜表面均勻平整顆粒明顯,薄膜吸收率可高達94%,發(fā)射率可低至3%。初步探究了不同厚度的SiO2減反層對TiNxOy選擇性吸收膜吸收發(fā)射性能的影響,并利用150℃熱老化和鹽霧實驗對其耐候性進行研究。當SiO2膜層較薄時,經(jīng)150℃熱老化和鹽霧實驗后吸收發(fā)射性能下降明顯。 關(guān)鍵字:太陽能選擇性吸收膜;磁控濺射技術(shù);吸收率;發(fā)射率;耐候性。
Abstract:The preparation technology of solar energy selective absorption coating is one of the key technologies of solar heat utilization while the optical characteristics of film system is of great concern to improve photo-thermal energy conversion efficiency, which is also one of the priority of study for the scientific research personnel presently. In this paper, TiNxOy and SS-AlN solar selective absorbing coating was successfully deposited through the magnetron sputtering technology and their structure and surface morphology have been characterized as well. For TiNxOy film with Ti target and Si target not only the deposition rate is high but each layer film is also smooth and uniform without color aberration; Delightfully, the average absorption rate of TiNxOy film can be as high as 92% while the firing rate as low as 4%. On the other hand, the SS target, Cu target and Al target of SS-AlN film have high deposition rate and uniform sputtering layers. The thin film made from SS-AlN film has thin smooth surface and apparent particles whose absorption rate can be as high as 94% while the firing rate as low as 3%. The influence of the thickness of SiO2 antireflection layers on absorption and emission properties has been preliminarily studied. The weather resistance has been studied in the heating aging experiments under the circumstance of 150℃ and salt spray tests. The aging experiments show that solar energy selective absorption films with a thinner SiO2 coating offer poor weather resistance. Keywords: Solar energy selective absorbing film;Magnetron sputtering technology; absorption rate;emission rate;weather resistance.
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